Title:
CHEMICALLY AMPLIFIED POSITIVE RESIST MATERIAL
Document Type and Number:
Japanese Patent JP3052815
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a chemically amplified positive resist material having high sensitivity and high resolution by incorporating an org. solvent, a specified high molecular compd., an acid generating agent and a dissolution controlling agent.
SOLUTION: This resist material contains an org. solvent, a high molecular weight compd. having repeating units represented by the formula and a wt. average mol.wt. of 3,000-300,000, an acid generating agent and a dissolution controlling agent which is a compd. having a wt. average mol.wt. of 100-1,000 and acid-unstable groups substd. for the hydrogen atoms of phenolic hydroxyl groups at 10-100% rate on average. In the formula, R1 is H or methyl, each of R4 and R5 is H or 1-6C straight chain or branched alkyl, R6 is 1-10C straight chain, branched or cyclic alkyl, (p), (q) and (r) are positive numbers satisfying 0.02≤p/(p+q+r)≤0.5, 0.01≤q/(p+q+r)≤0.3 and 0<(p+q)/(p+q+r)≤0.8 and (a) is a positive number of 1-3.
Inventors:
Osamu Watanabe
Jun Hatakeyama
Shigehiro Nagura
Toshinobu Ishihara
Jun Hatakeyama
Shigehiro Nagura
Toshinobu Ishihara
Application Number:
JP33789995A
Publication Date:
June 19, 2000
Filing Date:
December 01, 1995
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; G03F7/004; H01L21/027
Domestic Patent References:
| JP7319155A | ||||
| JP6273934A | ||||
| JP7120929A | ||||
| JP7134419A |
Attorney, Agent or Firm:
Takashi Kojima