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Title:
CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING NORBORNANE TYPE LOW MOLECULAR COMPOUND ADDITIVE
Document Type and Number:
Japanese Patent JP2001183839
Kind Code:
A
Abstract:

To provide a chemically amplified resist composition sensitive to far UV, having good transparency particularly to ArF excimer laser beam, excellent also in resolution and sensitivity characteristics and remarkably excellent in adhesiveness to a substrate, dry etching resistance, developability, etc.

The chemically amplified positive type photoresist composition comprises a multiple copolymer of formula I having a weight average molecular weight (Mw) (expressed in terms of polystyrene) of 3,000-50,000 and a molecular weight distribution (Mw/Mn) of 1.0-3.0, a low molecular compound additive of formula II or III, an acid generating agent and a solvent.


Inventors:
Seo, Dong Chul
Park, Sun YI
Park, Joo Hyeon
Kim, Seon-ju
Application Number:
JP2000000301107
Publication Date:
July 06, 2001
Filing Date:
September 29, 2000
Export Citation:
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Assignee:
KOREA KUMHO PETROCHEM CO LTD
International Classes:
C08F222/06; C08F232/00; C08F232/08; C08K5/00; C08K5/101; C08K5/17; C08L35/00; C08L45/00; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/039; C08F222/06; C08F232/00; C08L35/00; G03F7/004; H01L21/027
Attorney, Agent or Firm:
正林 真之