Title:
CHEMICALLY AMPLIFIED RESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3358272
Kind Code:
B2
Abstract:
PURPOSE: To improve stability of PED(postexposure time delay), to stably form a fine pattern with high accuracy, and to improve the pattern shape, resolution and heat resistance by incorporating a basic compd. which decomposes and changes into a neutral material during baking after irradiating with radiation.
CONSTITUTION: This compsn. is a chemically amplified resist compsn. which decomposes and changes into a neutral material during baking after irradiating with radiation. As for the basic compd., a sulfonyl hydrazide compd. expressed by formula I or II is used. In the formulae I and II, R1 is a hydroxy group, a halogen atom, a 1-6C alkyl group, a 1-6C alkoxy group, a 6-15C aryl group, or a 7-18C aralkyl group, (n) is 1 or 2, (1) and (m) are integers satisfying 1≤1≤5, 0≤m≤4 and 1≤1+m≤5, (p) and (q) are integers satisfying 1≤p≤7, 0≤q≤6, and 1≤p+q≤7, A is hydrogen atom or R1 when (n) is 1, and A is a bivalent group or single bond when (n) is 2.
Inventors:
Toru Kajita
Masayoshi Suzuki
Toshiyuki Ohta
Akira Tsuji
Masayoshi Suzuki
Toshiyuki Ohta
Akira Tsuji
Application Number:
JP2735794A
Publication Date:
December 16, 2002
Filing Date:
January 31, 1994
Export Citation:
Assignee:
JSR Corporation
International Classes:
G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP5158242A | ||||
| JP6273924A | ||||
| JP5181263A | ||||
| JP6194834A | ||||
| JP792680A | ||||
| JP611835A | ||||
| JP6266100A | ||||
| JP7333851A |