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Title:
化学増幅型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5445320
Kind Code:
B2
Abstract:
A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R 1 is H, F, CH 3 or CF 3 , Rf is H, F, CF 3 or CF 2 CF 3 , A is a divalent hydrocarbon group, R 2 , R 3 and R 4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. Recurring units containing an aromatic ring structure are present in an amount ‰¥ 60 mol% and the recurring units having formula (1) are present in an amount < 5 mol%.

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Inventors:
Keiichi Masunaga
Satoshi Watanabe
Keijun Tanaka
General Domon
Application Number:
JP2010110812A
Publication Date:
March 19, 2014
Filing Date:
May 13, 2010
Export Citation:
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Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
JP2010197618A
JP2008133448A
JP2008248063A
JP2009093137A
JP2010085971A
Foreign References:
WO2009057484A1
WO2008056795A1
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa



 
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