CHLOROPRENE-BASED POLYMER COMPOSITION AND ITS PRODUCTION - DENKI KAGAKU KOGYO KABUSHIKI KAISHA

Title:

CHLOROPRENE-BASED POLYMER COMPOSITION AND ITS PRODUCTION

Document Type and Number:

Japanese Patent JP3402559

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To obtain a chloroprene-based polymer composition widely improved in an ozone resistance, especially having a long cut life and further improved in an injection molding property, and to provide a method for producing the same.
SOLUTION: This chloroprene-based polymer composition consists of a chloroprene-based polymer containing an acrylic copolymer as a copolymer of (a) ethyl acrylate, (b) n-butyl acrylate and (c) an ethylenically unsaturated compound having epoxy group, and also is obtained by mixing a chloroprene- based polymer latex with an emulsion of the acrylic copolymer as the copolymer of (a) ethyl acrylate, (b) n-butyl acrylate and (c) the ethylenically unsaturated compound having epoxy group.

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Inventors:

Hiroaki Ohba
Masao Koga
Tsuyoshi Tsuji

Application Number:

JP13163596A

Publication Date:

May 06, 2003

Filing Date:

May 27, 1996

Export Citation:

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Assignee:

DENKI KAGAKU KOGYO KABUSHIKI KAISHA

International Classes:

C08L11/00; C08G59/32; C08L21/00; C08L33/04; C08L63/00; (IPC1-7): C08L11/00; C08L33/04; C08L63/00

Domestic Patent References:

JP8311248A
JP62116651A
JP6230155A
JP62236841A
JP6278273A
JP4202207A

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