Title:
CHLOROPRENE POLYMER COMPOSITION AND ADHESIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2006199933
Kind Code:
A
Abstract:
To provide a chloroprene polymer composition and an adhesive composition without readily discoloring with light or heat.
The chloroprene polymer composition comprises a chloroprene polymer, a benzotriazole ultraviolet light absorber, a hindered amine light stabilizer and a phenolic antioxidant. The benzotriazole ultraviolet light absorber is preferably at least one kind selected from 5-chloro-2-(3-tert-butyl-2-hydroxy-5-methylphenyl)benzotriazole or 2-(2'-hydroxy-3',5'-di-tert-amylphenyl)benzotriazole. The hindered amine light stabilizer is preferably at least one kind selected from bis(2,2,6,6-tetramethyl-4-piperidyl)sebacate or bis(1,2,2,6,6-pentamethyl-4-piperidyl)sebacate.
Inventors:
WATANABE KOSUKE
KANEDA KUNIO
YASHIMA HIROYUKI
TAKAHASHI YOSHIYUKI
KANEDA KUNIO
YASHIMA HIROYUKI
TAKAHASHI YOSHIYUKI
Application Number:
JP2005355587A
Publication Date:
August 03, 2006
Filing Date:
December 09, 2005
Export Citation:
Assignee:
DENKI KAGAKU KOGYO KK
International Classes:
C08L11/00; C08F259/02; C08K5/13; C08K5/3435; C08K5/3472; C09J11/06; C09J111/00; C09J151/04
Domestic Patent References:
JP2002317075A | 2002-10-31 | |||
JPH11116737A | 1999-04-27 |
Previous Patent: CHLOROPRENE POLYMER AND METHOD FOR PRODUCING THE SAME
Next Patent: HIGH-SOLIDS-CONTENT POLYURETHANE-POLYUREA DISPERSION
Next Patent: HIGH-SOLIDS-CONTENT POLYURETHANE-POLYUREA DISPERSION