PURPOSE: To obtain the subject new resin having a specific structure, which is useful as a molding material for thin films such as ion-exchange membranes for reverse osmosis desalting processes and ultrafiltration membranes for liquids and gives thin films exhibiting high rates of product flow and high degrees of salt rejection.
CONSTITUTION: The objective resin is a hydrolyzate of a chlorosulfonated polyarylethersulfone resin of formula I (Ar1 and Ar2 represent phenylene or phenylene partially substituted with non-activating groups, a part of the phenylene being substituted with hydroxysulfonyl and chlorosulfonyl in a proportion of the former to the latter of 1 to (0.01-20), the total amount of the both per gram of dry weight of the resin being 0.05-4 m - equivalents), which contains 0.05-4 m - equivalents of hydroxysulfonyl in the form of free acid for each gram of the hydrolyzate. The resin may be obtained by reacting a resin of formula II (Ar1 and Ar2 are phenylene or phenylene partially substituted with non-activating groups; L is a divalent linking group) with chlorosulfonic acid at 40-151°C after dissolving it in an inert organic solvent.
BENJIYAMIN BIKUSON
GAATORUUDO GOTSUTSU
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