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Title:
CHROME-FREE METHODS OF ETCHING ORGANIC POLYMERS WITH MIXED ACID SOLUTIONS
Document Type and Number:
Japanese Patent JP2014212319
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide chrome-free methods of etching organic polymers with mixed acid solutions.SOLUTION: A chrome-free acidic aqueous solution of sulfuric acid and one or more organic acids and manganese (II) and (III) ions are applied to an organic polymer surface to etch the surface. The etched surface is then plated with metal.

Inventors:
KATHARINA WEITERSHAUS
WAN ZHANG-BEGLINGER
ANDREAS SCHEYBAL
JONAS GUEBEY
Application Number:
JP2014084408A
Publication Date:
November 13, 2014
Filing Date:
April 16, 2014
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT
International Classes:
H01L21/308; H05K3/00
Domestic Patent References:
JP2015518083A2015-06-25
JP2016523995A2016-08-12
Foreign References:
WO2014164272A12014-10-09
US8603352B12013-12-10
Attorney, Agent or Firm:
Patent business corporation センダ international patent firm