Title:
CLEAN ROOM
Document Type and Number:
Japanese Patent JP3313385
Kind Code:
B2
Abstract:
PURPOSE: To restrict bad influence caused by leakage of gas by a method wherein a gas piping duct is arranged below a free access floor in a vertical layered flow type clean room having the free access floor and a gas piping to be connected to a semiconductor manufacturing device or the like is placed in it.
CONSTITUTION: An apertured floor panel 9 is placed through the second supporting columns on an upper floor 7 supporting some slabs 6 on supporting columns 5 vertically arranged on a building floor 4 to construct a free access floor 10, and then a semiconductor manufacturing device 12 is mounted on the free access floor 10 within the clean room 40. Air within the clean room 40 is sucked into a floor space 11 under an operation of a blower 24, thereafter the air is passed through a vertical duct 25 and supplied to a ceiling space 17, purified by a filter 16 and then circulated. Gas piping ducts 41 for use in placing gas pipings 30 to 32 or the like connected to the semi-conductor manufacturing device 12 are installed below the free access floor 10. The ducts 41 are formed in the repairing and maintenance region and their ends are connected to an air discharging duct.
Inventors:
Nobuo Fujie
Mitsuo Igarashi
Mitsuo Igarashi
Application Number:
JP32774191A
Publication Date:
August 12, 2002
Filing Date:
December 11, 1991
Export Citation:
Assignee:
富士通株式会社
International Classes:
E04F17/08; E04H5/02; F24F7/06; (IPC1-7): F24F7/06; E04F17/08; E04H5/02
Domestic Patent References:
| JP58164859A | ||||
| JP6415373A | ||||
| JP62169136U | ||||
| JP61189245U |
Attorney, Agent or Firm:
Tadahiko Ito (1 outside)