To provide a clean room which, in a semiconductor device manufacturing process, can completely prevent diffusion of chemical materials from a manufacturing device that uses the chemical materials and which can control air conditioning at low cost to meet the need for preventing chemical pollution when conveying or storing semiconductor wafers.
A clean room 1 is divided into a plurality of areas whose air conditioning systems are independent of one another, and in a second clean room 1b where a manufacturing device 6a leaking chemical materials is placed, a chemical filter is installed on a circulation duct 13 and an air conditioning method by which air from which chemical mist produced in a working zone 5 has been removed is circulated to a ceiling chamber 4 is adopted to prevent the diffusion of the chemical mist to the areas with different air conditioning systems. In a first clean room 1 a where conveyors 7a, 7b and storage devices 8a, 8b or the like are installed, an air conditioning method by which chemical- free air is supplied locally to only the required areas is adopted.
FUKUMOTO HAYAAKI
SHIBUYA HIROSHI
EZAKI KOJI
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