Title:
CLEANING APPARATUS, CARRYING APPARATUS THEREIN AND CARRYING METHOD
Document Type and Number:
Japanese Patent JP3954664
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To enable quick removal of trouble which occurs on a carrying path, by, e.g. preventing contamination due to particles which occur while carrying a silicon wafer when, e.g. the silicon wafer is treated as an object of cleaning.
SOLUTION: A cassette K containing a silicon wafer SW is carried while being supported from a position under it. This prevents particles from reaching the silicon wafer. Further, a carrying route (main route) 77 is set along positions of respective operations such as O/F alignment. When a trouble occurs, an object silicon wafer is carried backward along the carrying route, and it can be taken out of the apparatus, avoiding the subsequent silicon wafer.
More Like This:
Inventors:
Tadayasu Osawa
Application Number:
JP33259595A
Publication Date:
August 08, 2007
Filing Date:
November 28, 1995
Export Citation:
Assignee:
Kaijo Co., Ltd.
International Classes:
B08B3/04; H01L21/304; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B08B3/04; H01L21/304
Domestic Patent References:
JP69129U | ||||
JP4323847A | ||||
JP6236914A | ||||
JP5186044A | ||||
JP62208619A | ||||
JP750333A | ||||
JP6338555A | ||||
JP7147316A | ||||
JP6267919A | ||||
JP7183356A | ||||
JP62291044A |
Attorney, Agent or Firm:
Masaharu Hagiri