Title:
CLEANING BRUSH, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2023012423
Kind Code:
A
Abstract:
To provide a technique for enhancing the removal efficiency of particles with a cleaning brush.SOLUTION: A cleaning brush cleans a chucking surface of a chuck. The cleaning brush includes a brush base linearly extending radially to an outside in a radial direction from a rotation center line of the chuck, and a plurality of contact portions which protrudes from the brush base and contacts the suction surface. When viewed in a direction orthogonal to the suction surface, a plurality of rows each including the plurality of contact portions arranged at intervals in a first direction, is provided at intervals in a second direction intersecting the first direction. The second direction is a longitudinal direction of the brush base. In each of the rows, at least two contact portions are of different types.SELECTED DRAWING: Figure 6
Inventors:
WAKAMATSU TAKAAKI
KODAMA MUNEHISA
KODAMA MUNEHISA
Application Number:
JP2022090150A
Publication Date:
January 25, 2023
Filing Date:
June 02, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L21/304; B23Q11/00; B24B7/04; B24B55/06
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito