Title:
CLEANING FLUID FOR LIQUID INJECTION DEVICE, LIQUID INJECTION DEVICE, AND CLEANING METHOD OF LIQUID FLOW PATH
Document Type and Number:
Japanese Patent JP2018150495
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide cleaning fluid for a liquid injection device capable of suppressing residue of bubbles in a liquid flow path; and to provide the liquid injection device, and a cleaning method of the liquid flow path.SOLUTION: There is provided cleaning fluid for a liquid injection device circulated into a liquid flow path (supply tube 9) provided in the liquid injection device (printer 1). The cleaning fluid for the liquid injection device contains at least a water-soluble organic solvent, a silicone-based surfactant and an acetylenediol-based surfactant. Further, the inner surface of at least a part of the liquid flow path (supply tube 9) comprises a fluorine-based material.SELECTED DRAWING: Figure 1
Inventors:
YAMAMOTO SHINICHI
Application Number:
JP2017049696A
Publication Date:
September 27, 2018
Filing Date:
March 15, 2017
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
C11D17/08; B08B3/08; B08B9/032; B41J2/165; B41J2/175; B41J2/19; C11D1/68; C11D1/82; C11D3/43
Attorney, Agent or Firm:
Kazuaki Watanabe
Keisuke Nishida
Satoshi Nakai
Keisuke Nishida
Satoshi Nakai