Title:
CLEANING FLUID OF RESIST PEELING LIQUID FILTRATION FILTER, CLEANING DEVICE AND CLEANING METHOD
Document Type and Number:
Japanese Patent JP2015020100
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To reuse again as a filtration filter by removing resist from a filter having filtrated resist peeling liquid obtained by removing positive type resist from a substrate.SOLUTION: A resist peeling liquid filtration filter after use is immersed into a cleaning fluid of the resist peeling liquid filtration filter containing ammonia as much as 2.5-12.5 mass% with respect to the whole amount of the cleaning fluid and hydrogen peroxide as much as 8.8-17.5 mass% with respect to the whole amount of the cleaning fluid. Hereby, attached resist can be removed, and further the resist peeling liquid filtration filter can be reused.
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Inventors:
FUCHIGAMI SHINICHIRO
Application Number:
JP2013148925A
Publication Date:
February 02, 2015
Filing Date:
July 17, 2013
Export Citation:
Assignee:
PANASONIC IP MAN CORP
International Classes:
B01D41/04; B01D19/02; B08B3/08; H01L21/027; H01L21/304
Domestic Patent References:
| JP2002151459A | 2002-05-24 | |||
| JP2007266477A | 2007-10-11 | |||
| JP2004298680A | 2004-10-28 | |||
| JP2003210912A | 2003-07-29 | |||
| JP2005251936A | 2005-09-15 | |||
| JPS6323326A | 1988-01-30 | |||
| JPS63294989A | 1988-12-01 | |||
| JPS6276624A | 1987-04-08 | |||
| JPH1079369A | 1998-03-24 | |||
| JP2001353424A | 2001-12-25 |
Attorney, Agent or Firm:
Hiroyuki Masaki
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