Title:
CLEANING LIQUID COMPOSITION FOR MASK USED IN VACUUM DEPOSITION IN PRODUCTION OF LOW-MOLECULAR ORGANIC EL ELEMENT AND CLEANING METHOD
Document Type and Number:
Japanese Patent JP3833650
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To provide a cleaning liquid composition and a cleaning method capable of removing various organic materials attached to a mask in the vacuum deposition for the production of a low-molecular organic EL element with a single cleaning liquid.
SOLUTION: The cleaning liquid composition for a mask used in the vacuum deposition for the production of a low-molecular organic EL element contains one or more kinds of aprotic polar solvents.
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Inventors:
Ishikawa, Norio
Kinomura, Yoshitaka
Hijiya, Hideki
Kinomura, Yoshitaka
Hijiya, Hideki
Application Number:
JP2003000406394
Publication Date:
July 28, 2006
Filing Date:
December 04, 2003
Export Citation:
Assignee:
KANTO CHEM CO INC
SANYO ELECTRIC CO LTD
SANYO ELECTRIC CO LTD
International Classes:
C11D7/50; H05B33/10; B08B3/12; C09K11/06; C11D1/00; H01L51/50; H05B33/12; H05B33/14; C11D7/50; H05B33/10; B08B3/12; C09K11/06; C11D1/00; H01L51/50; H05B33/12; H05B33/14; (IPC1-7): C11D7/50; H05B33/10; H05B33/14
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