Title:
(メタ)アクリル酸及び/又は(メタ)アクリル酸エステルの製造のための工場装置部用洗浄液及びこれを利用した洗浄方法
Document Type and Number:
Japanese Patent JP4282719
Kind Code:
B2
Abstract:
The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt % of a water-soluble amino acid, 0.001 to 0.05 wt % of N,N'-methylene bisacrylamide, and 0.001 to 0.05 wt % of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.
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Inventors:
Theoc-Han Choi
Theon-Pill Kang
Kyung-Su Ha
Geon-Young Kim
Boo-Gong Woo
Theon-Pill Kang
Kyung-Su Ha
Geon-Young Kim
Boo-Gong Woo
Application Number:
JP2006524591A
Publication Date:
June 24, 2009
Filing Date:
May 17, 2005
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
C11D7/06; C11D9/02; B08B3/08; B08B9/02; B08B9/08; C11D1/00; C11D7/32; C11D11/00; F28G9/00
Domestic Patent References:
| JP2003183220A | ||||
| JP2000319223A | ||||
| JP2001520214A | ||||
| JP2152550A | ||||
| JP2001316693A | ||||
| JP11181587A | ||||
| JP2000502394A | ||||
| JP58071907A | ||||
| JP64062317A |
Attorney, Agent or Firm:
Sumio Tanai
Shinya Mitsuhiro
Shinya Mitsuhiro