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Patent Searching and Data


Title:
CLEANING MATERIAL
Document Type and Number:
Japanese Patent JP2013006252
Kind Code:
A
Abstract:

To provide a cleaning material by which a clean surface can be obtained without leaving a deep flaw on a surface after cleaning, and cleaning and stain-removing work can be performed in a stress-free and simple manner even during the work.

Slurry is generated by uniformly dispersing elastic particles 2 having a hardness range of 30 to 70 at rubber elasticity JIS 6253 and particle sizes of a 30 to 500 micron range and polishing particles 3a of a 0.2 to 25 micron range in an adhesive 5. The slurry is applied on a water-resistant smooth base material 4 to form a cleaning layer 1 where polishing particles are present on the surrounding surface of the elastic particles.


Inventors:
Kuwahara, Yoshimitsu
Application Number:
JP2011000141614
Publication Date:
January 10, 2013
Filing Date:
June 27, 2011
Export Citation:
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Assignee:
SOPHIA CORPORATION:KK
International Classes:
B24D3/00; A47L1/15; A47L13/16; B24D3/28; B24D11/00
Domestic Patent References:
JPS57127664A1982-08-07
JPS62292367A1987-12-19
JPS58121664U1983-08-18
JPH01205978A1989-08-18
JPS57127664A1982-08-07
Foreign References:
US2542058A1951-02-20
US2542058A1951-02-20
Attorney, Agent or Firm:
佐藤 英世