To provide a cleaning material by which a clean surface can be obtained without leaving a deep flaw on a surface after cleaning, and cleaning and stain-removing work can be performed in a stress-free and simple manner even during the work.

Slurry is generated by uniformly dispersing elastic particles 2 having a hardness range of 30 to 70 at rubber elasticity JIS 6253 and particle sizes of a 30 to 500 micron range and polishing particles 3a of a 0.2 to 25 micron range in an adhesive 5. The slurry is applied on a water-resistant smooth base material 4 to form a cleaning layer 1 where polishing particles are present on the surrounding surface of the elastic particles.