CLEANING METHOD AND DEVICE

Japanese Patent JP3690619

B2

PROBLEM TO BE SOLVED: To clean a substrate in a short time by a method wherein alkaline metal halogenide is mixed into an organic solvent diluted with pure water for the formation of a cleaning solution, the substrate is immersed into the cleaning solution, and ultrasonic waves are made to irradiate the mixed cleaning solution to remove an organic film from the surface of the substrate.
SOLUTION: A cleaning solution 102 composed of pure water, isopropyl alcohol, and hydrogen fluoride or ammonium fluoride or potassium fluoride is filled in an inner tank 101, an ultrasonic vibrator 105 is mounted on the outer wall of the outer tank 103, and liquid 104 of pure water or the like is filled in the outer tank 103. A substrate is dipped into the cleaning solution 102, a high-voltage is applied to the ultrasonic vibrator 105, ultrasonic waves oscillated from the vibrator 105 are made to irradiate the cleaning solution 102 through the intermediary of the outer tank 103, the liquid 104, and the inner tank 101, whereby an organic film on the substrate is removed by a multiplier effect of ultraviolet waves and the ingredients of the cleaning solution 102 at a room temperature or so. By this setup, a cleaning treatment can be carried out in a shorter time.

JP7437248

Cleaning method and cleaning system

Tadahiro Ohmi
Izumi Kojima
Yuhisa Nitta

JP19568896A

August 31, 2005

July 05, 1996

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Tadahiro Ohmi
UCT Co., Ltd.

B08B3/02; B08B3/10; B08B3/12; G03F7/42; H01L21/00; H01L21/304; H01L21/306; H01L21/308; (IPC1-7): H01L21/304; B08B3/12; H01L21/306; H01L21/308

JP7263398A
JP7039839A
JP7201794A
JP3116832A
JP7245285A

Hisao Fukumori

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