Title:
CLEANING METHOD FOR INCOMPLETELY DECOMPOSED SUBSTANCE OF ALKOXYSILANE
Document Type and Number:
Japanese Patent JP3117069
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a cleaning method in which it is not required to precisely control a temperature and an HF-gas concentration by a method wherein a polymerized substance which is decomposed inside a reactor and on a jig, a component and a pipe at an apparatus used to form a silicon oxide film is exposed to oxygen so as to be cleaned with an HF gas.
SOLUTION: The polymerized substance of tetraethoxysilane, containing C, H, O and S, which is deposited inside a reactor and on a jig, a component and a pipe at an apparatus used to form a silicon oxide film is pretreated with an HF gas such as O2, F2 ClF, ClF3, BrF3, BrF5, IH3, IF5, IF7 or the like, a functional group as a cause to generate H2O in an HF cleaning operation such as a hydroxyl group, a methoxy group or the like is desorbed, and a cleaning operation is performed without corroding a metal by a hydrofluoric acid. Thereby, it is not required to precisely control a temperature and an HF-gas concentration.
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Inventors:
Isamu Mohri
Tetsuya Tamura
Tetsuya Tamura
Application Number:
JP28705395A
Publication Date:
December 11, 2000
Filing Date:
November 06, 1995
Export Citation:
Assignee:
Central Glass Co., Ltd.
International Classes:
B01J19/00; C09K13/04; C09K13/08; C23C16/44; C23C16/50; H01L21/304; (IPC1-7): C09K13/08; C23C16/44
Domestic Patent References:
| JP6330323A | ||||
| JP5214339A | ||||
| JP394059A |
Attorney, Agent or Firm:
Yoshiyuki Nishi