Title:
CLEANING METHOD FOR WET OXIDIZATION DEVICE
Document Type and Number:
Japanese Patent JPH06277679
Kind Code:
A
Abstract:
PURPOSE: To remove solid matters such as scales or sediments generated inside a wet oxidization device and clean a catalyst, an adsorption material, a filler and the like attached to a reactor.
CONSTITUTION: A wet oxidization device is cleaned under the pressure in which cleaning liquid retains the liquid phase containing sodium hydroxide and/or potassium hydroxide at a temperature of 50°C-300°C in the cleaning method for the wet oxidization device. It is preferable to clean the wet oxidization device under the supply of a gas containing oxygen.
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Inventors:
SHIODA YUSUKE
ISHII TORU
MITSUI KIICHIRO
TAKASHIMA TAKEHIRO
ISHII TORU
MITSUI KIICHIRO
TAKASHIMA TAKEHIRO
Application Number:
JP6812393A
Publication Date:
October 04, 1994
Filing Date:
March 26, 1993
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C02F1/74; C02F5/00; C02F5/08; (IPC1-7): C02F1/74; C02F1/74