Title:
プロセスチャンバのクリーニング
Document Type and Number:
Japanese Patent JP2013500595
Kind Code:
A
Abstract:
A method for cleaning at least one component arranged in the inner region of a plasma process chamber using a cleaning gas including fluorine gas, where the process chamber has at least one electrode and counter-electrode for generating a plasma for plasma treatment, where the inner region is exposed to gaseous fluorine compounds with a partial pressure of greater than 5 mbar, where the process chamber has at least one electrode and counter-electrode for generating a plasma, and the fluorine gas is thermally activated by means of a temperature-regulating means, where the component to be cleaned has a temperature of<350° C.
Inventors:
Rudolf Beckman
Michael Geisler
Halalto lost
Michael Geisler
Halalto lost
Application Number:
JP2012521986A
Publication Date:
January 07, 2013
Filing Date:
May 28, 2010
Export Citation:
Assignee:
Leybold Optics GmbH
International Classes:
H01L21/205; C23C16/44; H01L21/304; H01L21/3065; H05H1/46
Attorney, Agent or Firm:
Takuya Kuno
Takahashi
Kiyoshi Kuruma
Kimihiro Hoshi
Hiroyasu Ninomiya
Shuichi Sumiyoshi
Ryoichi Shino
Ueshima
Yasushi Miyagi
Einzel Felix-Reinhard
Takahashi
Kiyoshi Kuruma
Kimihiro Hoshi
Hiroyasu Ninomiya
Shuichi Sumiyoshi
Ryoichi Shino
Ueshima
Yasushi Miyagi
Einzel Felix-Reinhard