Title:
CLEANING RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPH03182535
Kind Code:
A
Abstract:
PURPOSE:To obtain a cleaning resin composition which when used even in a small amount can clean a molding machine for molding a chlorinated resin such as PVC within a short time by mixing a PS resin with a polymethyl methacrylate resin, a neutral sulfonate, a basic magnesium carbonate, etc. CONSTITUTION:A cleaning resin composition is obtained by mixing 50-95wt.% PS resin (e.g. methacrylate/styrene resin) with 0.1-15wt.% polymethyl methacrylate, 2-30wt.% neutral sulfonate (e.g. a sodium salt of a 10-18C alkylbenzenesulfonate) and 0.1-10wt.% basic magnesium carbonate, magnesium hydroxide, aluminum hydroxide, zinc carbonate or mixture of at least two of them. This composition can clean a molding machine very effectively in the change-over of types of chlorinated resins such as PVC and chlorinated PS which are liable to cause thermal decomposition during molding. When this composition is used, the amount of the subsequent cleaning resin used can be decreased and the cleaning time can be shortened.
Inventors:
KOHAMA KENJIRO
YAMADA KENTARO
FUJII HIROYUKI
YAMADA KENTARO
FUJII HIROYUKI
Application Number:
JP32243589A
Publication Date:
August 08, 1991
Filing Date:
December 12, 1989
Export Citation:
Assignee:
CHISSO CORP
International Classes:
B29C33/72; B29C48/27; C08K3/00; C08K3/22; C08K3/26; C08K5/42; C08L25/00; C08L25/04; C08L25/08; C08L33/00; C11D1/22; C11D3/12; C11D3/37; C11D10/02; B29C48/04; C08L33/12; (IPC1-7): C08K3/22; C08L25/04; C08L25/08
Domestic Patent References:
| JPS6366245A | 1988-03-24 | |||
| JPS50102654A | 1975-08-14 | |||
| JPS62195045A | 1987-08-27 | |||
| JPS58149998A | 1983-09-06 |
Attorney, Agent or Firm:
Yataro Sasai (1 person outside)