CLEANING SOLUTION AND METHOD FOR CLEANING

Title:

CLEANING SOLUTION AND METHOD FOR CLEANING

Document Type and Number:

Japanese Patent JPH0214294

Kind Code:

A

Abstract:

PURPOSE: To preferably carry out cleaning of various articles requiring a high level of cleanness, such as molded fluororesin product vessels, tubes, wafers, carriers, etc., for wet etching agents employed in producing semiconductors by using a cleaning solution consisting of an aqueous solution of an electrolyte in a high concentration.

CONSTITUTION: The objective cleaning solution obtained by preparing an electrolyte preferably selected from the group consisting of NH4Cl, NH4F, KCl, KF, NaCl, MgCl2, MgCO3, ZnCl2, ZnSO4, FeCl3, FeOS4, AlCl3 and Al2(SO4)3 in the form of an aqueous solution in a concentration as high as preferably ≥0.5wt.%. A method for cleaning preferably includes cleaning-steps with the above-mentioned cleaning solution and with super pure water respectively at least once and further a cleaning step with dilute hydrofluoric acid.

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Inventors:

KAWAKAMI YASUMASA
ITANO MITSUSHI
YOSHII SHIGEYUKI

Application Number:

JP16522388A

Publication Date:

January 18, 1990

Filing Date:

July 01, 1988

Export Citation:

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Assignee:

DAIKIN IND LTD

International Classes:

C11D7/10; C23G1/00; H01L21/027; H01L21/30; H01L21/304; H05K3/26; (IPC1-7): C11D7/10; C23G1/00; H01L21/027; H01L21/30; H05K3/26

Attorney, Agent or Firm:

Eiji Saegusa (2 others)

Next Patent: AZEOTROPE OF 1,1-DIFLUORO-2,2-DICHLOROETHANE AND METHANOL OR ETHANOL