Title:
CLEANROOM
Document Type and Number:
Japanese Patent JP2002147811
Kind Code:
A
Abstract:
To provide a cleanroom for preventing objects to be processed, such as semiconductor wafers, and be capable of reducing a running cost of a chemical filter.
Apparatus installation areas 3e and 3f, where an apparatus body 14 for processing the object to be processed, a process area 4 where an object to be processed is loaded or unloaded by the apparatus body 14, and an operation area 2, where operation on the apparatus is effected are brought into a state to be aligned horizontally in the order via partitions 42 and 43. Air conditioning of the apparatus installation areas 3e and 3f, that of the process area 4, and that of the operation area 2 are carried out independently of each other.
Inventors:
NAKAGAWA TOSHIAKI
Application Number:
JP2000340292A
Publication Date:
May 22, 2002
Filing Date:
November 08, 2000
Export Citation:
Assignee:
SHARP KK
International Classes:
E04H5/02; F24F3/16; F24F7/06; H01L21/00; H01L21/02; (IPC1-7): F24F7/06; E04H5/02
Attorney, Agent or Firm:
Aoyama Ryo (1 person outside)