PURPOSE: To form the image sensor used for a facsimile, an OCR, etc. with a beam introducing system of a high optical utilization rate by using etching and thin-film technique.
CONSTITUTION: Light-receiving elements 11 are formed on one surface of a transparent substrate 10 made of glass, etc. in a row at regular intervals, thus forming a light- receiving element array. High refractive-index light-transmitting hemispherical islands 12 are formed at positions corresponding to the light-receiving elements 11 on the other surface of the substrate 10, and other sections are coated with light-nontransmitting films 13. The light-nontransmitting film 13 is formed in such a manner that a metal is evaporated under vacuum and the island 12 sections are removed through etching or a lift-off method at that time. The high refractive-index light-transmitting hemispherical islands 12 are formed through the sputtering of a material such as TiO2 or etching. Multilayer thin-films 14, refractive indices thereof are changed continuously, are formed on the islands 12 and the light-nontransmitting films 13. The multilayer thin-films 14 are formed through a CVD method in a mixed gas of silane gas and oxygen, but a mixing ratio of Si and O of SiOX can be changed by altering a mixing ratio of silane gas and oxygen. The beam introducing system of a large opening ratio is obtained because the multilayer thin-films 14 have a lens effect and the light-transmitting islands 12 also function as lenses.
| JP2004172806 | IMAGE READER |
| JPS60218968 | OPTICAL READER |
| JP2018174465 | LINE SENSOR DEVICE, READER, AND RECORDING SYSTEM |
OZAWA KIYOSHI
OOURA MICHIYA
HIRANAKA KOUICHI
