Title:
Co-Fe-Nb-BASED SPUTTERING TARGET
Document Type and Number:
Japanese Patent JP2018070994
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To eliminate falling of particles in a sputtering process, an abnormal arc and scattering by effectively suppressing a niobium oxide from precipitating and reducing the amount of inclusions thereof.SOLUTION: There is provided a Co-Fe-Nb-based sputtering target including cobalt, iron, an active element, a first additive agent, and a second additive agent. The active element can contain niobium, the first additive agent can contain tungsten or molybdenum, and the second additive agent can contain magnesium, carbon, boron, chromium, calcium, or an arbitrary combination thereof. For the total amount of the Co-Fe-Nb-based sputtering target, the total amount of the active element is 20 at% or less, the total amount of the active element and the first additive agent is 25 at% or less, and the total amount of the second additive agent is 0.5 at% or less. With this composition, the ratio of niobate particles to a surface of the Co-Fe-Nb-based sputtering target is effectively reducible to 35 pieces/mm, thereby evading problems of an arc and sputtering in sputtering.SELECTED DRAWING: Figure 1A
More Like This:
Inventors:
LIN HUNG-CHENG
HUANG WEI-CHIN
LIU I-LUNG
CHENG HUI-WEN
HUANG WEI-CHIN
LIU I-LUNG
CHENG HUI-WEN
Application Number:
JP2017115015A
Publication Date:
May 10, 2018
Filing Date:
June 12, 2017
Export Citation:
Assignee:
SOLAR APPLIED MATERIALS TECH CORP
International Classes:
C23C14/34; C22C19/07; C22C38/00; G11B5/738; G11B5/851
Domestic Patent References:
| JP2009167529A | 2009-07-30 | |||
| JPH11264058A | 1999-09-28 | |||
| JP2009167529A | 2009-07-30 | |||
| JPH11264058A | 1999-09-28 | |||
| JP2016149170A | 2016-08-18 | |||
| JP2016149170A | 2016-08-18 |
Attorney, Agent or Firm:
Kazuo Moriya