Title:
COATING COMPOSITION FOR FORMING SILICA-BASED FILM AND COATED SUBSTRATE
Document Type and Number:
Japanese Patent JP3192876
Kind Code:
B2
Abstract:
PURPOSE: To obtain a silica-based film-forming coating composition excellent in the smoothness, strength, etc., of the film by incorporating a modified polysilazane obtained by reacting a specific polysilazane with a phenol.
CONSTITUTION: A modified polysilazane is produced by reacting at least one polysilazane having at least repeating units represented by the formula (wherein R1, R2, and R3 each is H, or a 1-8C alkyl) with a phenol (e.g. cresol) or by reacting the polysilazane with an alcohol (e.g. methanol) and then with a phenol. The modified polysilazane is dissolved in an organic solvent (e.g. hexane) to produce the objective composition. This composition is applied to a substrate, dried, and baked, thereby giving a coated substrate having a coating film with a high degree of surface flatness.
Inventors:
Nakajima Akira
Toshiro Komatsu
Takahashi Miki
Shunichi Fukuyama
Yoshihiro Nakata
Toshiro Komatsu
Takahashi Miki
Shunichi Fukuyama
Yoshihiro Nakata
Application Number:
JP15095894A
Publication Date:
July 30, 2001
Filing Date:
July 01, 1994
Export Citation:
Assignee:
触媒化成工業株式会社
富士通株式会社
富士通株式会社
International Classes:
C08G77/48; G02F1/1333; C09D183/00; C09D183/16; H01L21/316; (IPC1-7): C09D183/16
Domestic Patent References:
| JP63250012A | ||||
| JP236220A |
Attorney, Agent or Firm:
Shunichiro Suzuki