To provide a coating film formation apparatus which does not affect a processing, when a processing part is supplied with a chemical liquid, or gas and liquid are discharged from the processing part.

A chemical liquid part comprising a chemical liquid supply system and an exhaust/liquid discharge process system, which is housed in a side cabinet 2 is provided adjacent to a process part 1 for applying a substrate with a coating liquid for forming a coating film, with an interval from the process part 1. For the side cabinet 2 which is a chemical liquid part, ammonia and HMDS is supplied to an aging unit (DAS) 21 and a solvent exchange unit (DSE) 11, respectively, from the chemical liquid supply system, while exhausting and liquid-discharging after process are done with the exhausting/liquid- discharging process system.