Title:
塗布膜形成方法及び塗布膜形成装置
Document Type and Number:
Japanese Patent JP7202960
Kind Code:
B2
Abstract:
To appropriately form a coating film on the side end surface of a substrate in forming the coating film on the substrate.SOLUTION: A coating film forming method for forming a coating film on a substrate includes a first step of applying a coating liquid for forming the coating film on the entire surface of the substrate while rotating the substrate, and causing the coating liquid to wrap around to the side end surface of the substrate, a second step of supplying a first liquid that does not dissolve the coating film formed by coating the coating liquid from the upper surface side of the substrate to at least the side end surface after the first step, a third step of supplying a second liquid for dissolving the coating film from the lower surface side of the substrate to a desired position on the side end surface while further supplying the first liquid after the second step, and a fourth step of stopping the supply of the first liquid and the supply of the second liquid after the third step.SELECTED DRAWING: Figure 4
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Inventors:
Shinichi Hatakeyama
Iino Yoko
Iino Yoko
Application Number:
JP2019077944A
Publication Date:
January 12, 2023
Filing Date:
April 16, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; B05D1/40; B05D3/00
Domestic Patent References:
| JP2008205286A | ||||
| JP2001319910A | ||||
| JP2016139743A | ||||
| JP2002343704A | ||||
| JP2008288488A |
Attorney, Agent or Firm:
Kanemoto Tetsuo
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine
Koji Hagiwara
Naoki Ogita
Takashi Saito
Takuya Mine