PURPOSE: To obtain the titled coating having excellent abrasion resistance, scratching resistance and chemical resistance and capable of providing a coating film forming pattern having beautiful value on a substrate such as glass in simple process, by incorporating a silane coupling agent to photopolymerization composition at a specific ratio.
CONSTITUTION: The aimed coating obtained by incorporating (B) 1W200pts.wt., preferably 2W100pts.wt. compound expressed by formula SH-R1-SiH(3-n)R2(n) (R1 is ether or hydrocarbon; R2 is ether; n is 1W3) to (A) 100pts.wt. photopolymerization composition containing (i) 0W60wt.% monomer having ≥3 photosetting acryloyl groups or methacryloyl groups in one molecule, (ii) 0W40wt.% reactive diluent, (iii) 5W70wt.% photopolymerizable oligomer containing acidic component in the molecule, (iv) 5W70wt.% film forming polymer and (v) 0.1W10wt.% photopolymerization initiator and also applicable to material having low heat resistance such as plastic without requiring baking or heat curing.
ODAGIRI SATORU
KIKUIRI TETSUO
NEMOTO TSUTOMU
TAKAHASHI SHIGERU
