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Patent Searching and Data


Title:
COATING LAYER REMOVING AGENT, REGENERATING METHOD OF BASE MATERIAL AND MANUFACTURING METHOD OF ARTICLE HAVING COATING LAYER
Document Type and Number:
Japanese Patent JP2002309128
Kind Code:
A
Abstract:

To provide a removing agent capable of easily and safely removing in a short time an organic silicon coating layer and/or an oxide coating layer provided on a base material made of a resin, to provide a recovering and regenerating method of the base material made of the resin using the removing agent, and to provide a manufacturing method of an article having the coating layer using the regenerated base material.

The removing agent for the organic silicon-based coating layer and/or the oxide coating layer comprises a hydrogen fluoride compound and a surfactant. The regenerating method for the base material comprises dipping article having the organic silicon-based coating layer, the oxide coating layer, or the organic silicon-based coating layer and the oxide coating layer on the base material in an aqueous solution containing the hydrogen fluoride compound and the surfactant and removing at least a part or the whole of the coating layer. The manufacturing method of the article having the coating layer comprises providing the organic silicon-based coating layer, the oxide coating layer, or the organic silicon coating layer and the oxide coating layer on the base material regenerated by the regenerating method.


Inventors:
ARAI AKIKO
Application Number:
JP2001115494A
Publication Date:
October 23, 2002
Filing Date:
April 13, 2001
Export Citation:
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Assignee:
HOYA CORP
International Classes:
G02B1/10; C09D9/04; G02B1/115; G02B1/14; (IPC1-7): C09D9/04; G02B1/10
Attorney, Agent or Firm:
Sykes (2 outside)