Title:
COATING LIQUID AND FILM FORMING METHOD
Document Type and Number:
Japanese Patent JP2023097345
Kind Code:
A
Abstract:
To provide a coating liquid that can suppress gelation without using a chlorine-based solvent, and when formed into a film, can be dried at a low temperature and yield a film of small amount of residual solvent.SOLUTION: The present invention provides a coating liquid that comprises a solvent containing a cyclic ether-based solvent by 1 to 100 wt.% and an ester-based solvent by 0 to 99 wt.%, and an N-alkylmaleimide-based polymer. The present invention also provides a film-forming method of coating the coating liquid on a substrate and drying the coating liquid.SELECTED DRAWING: None
Inventors:
WATANABE (GOTO) MISAKI
KATAGIRI FUMIAKI
YAMADA SATORU
KITAGAWA TAKAHIRO
KOIKE YASUHIRO
KATAGIRI FUMIAKI
YAMADA SATORU
KITAGAWA TAKAHIRO
KOIKE YASUHIRO
Application Number:
JP2022155430A
Publication Date:
July 07, 2023
Filing Date:
September 28, 2022
Export Citation:
Assignee:
TOSOH CORP
KAI PHOTONICS CO LTD
KAI PHOTONICS CO LTD
International Classes:
C08L33/24; C08F22/40; C08J5/18
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK