Title:
COATING SOLUTION FOR FORMING FLAT-SURFACE INSULATING FILM, AND SUBSTRATE COATED WITH FLAT-SURFACE INSULATING FILM
Document Type and Number:
Japanese Patent JP2010092627
Kind Code:
A
Abstract:
To provide: a coating solution for forming a flat-surface insulating film, capable of forming an organic modified silicate insulating film having a film thickness of 0.5 m or more, flexibility capable of following even deformation of a substrate, and extremely high flatness on the film surface on which miniature components such as electronic devices can be mounted; and the substrate coated with the flat-surface insulating film.
This coating solution for forming the flat-surface insulating film is a coating solution containing metal alkoxide, poly dimethyl siloxane, and an organic solvent, and a C-F bond in =CF2 exists in this solution, and the substrate coated with the flat-surface insulating film uses this solution.
Inventors:
OGURA TOYOJI
YAMADA NORIKO
KUBO YUJI
YAMADA NORIKO
KUBO YUJI
Application Number:
JP2008258960A
Publication Date:
April 22, 2010
Filing Date:
October 03, 2008
Export Citation:
Assignee:
NIPPON STEEL MATERIALS CO LTD
International Classes:
H01B19/00; C23C26/00; H01L21/312; H01L21/316
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
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