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Title:
COATING TYPE COMPOSITION FOR FORMING BPSG FILM, SUBSTRATE, AND METHOD FOR FORMING PATTERN
Document Type and Number:
Japanese Patent JP2016074774
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a coating-type composition for forming a BPSG film excellent in adhesion in a fine pattern, capable of wet-etching easily with a stripping liquid which does not damage a coating type organic film necessary for a semiconductor substrate and a patterning process, and a CVD film composed mainly of carbon, capable of maintaining releasability even after dry etching, and further capable of suppressing the generation of particles as forming by a coating process.SOLUTION: The coating-type composition for forming BPSG film includes: a compound having not less than one of structures composed of silicone as a skeleton represented by the formulae (1), not less than one of structures composed of phosphoric acid as a skeleton, not less than one of structures composed of boric acid as a skeleton, not less than one of structures composed of silicone as a skeleton, and a silicon-silicon bond.SELECTED DRAWING: None

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Inventors:
TACHIBANA SEIICHIRO
TANEDA YOSHINORI
KIKUCHI RIE
OGIWARA TSUTOMU
Application Number:
JP2014204545A
Publication Date:
May 12, 2016
Filing Date:
October 03, 2014
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C09D183/06; C08G77/48; C08G77/56; C08G79/00; G03F7/09; G03F7/11; G03F7/16; G03F7/26; H01L21/027
Domestic Patent References:
JPS6449037A1989-02-23
JP2008052203A2008-03-06
JP2006023706A2006-01-26
JP2006139083A2006-06-01
JP2013137512A2013-07-11
JPS5534258A1980-03-10
JPS5534276A1980-03-10
JPS6449037A1989-02-23
JP2008052203A2008-03-06
JP2006023706A2006-01-26
JP2006139083A2006-06-01
JP2013137512A2013-07-11
JPS5534258A1980-03-10
JPS5534276A1980-03-10
Attorney, Agent or Firm:
Mikio Yoshimiya



 
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