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Title:
COBALT-CONTAINING COMPOUNDS, SYNTHESIS THEREOF, AND USE THEREOF IN DEPOSITION OF COBALT-CONTAINING FILMS
Document Type and Number:
Japanese Patent JP2018118989
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide cobalt compounds suitable for deposition of cobalt-containing films.SOLUTION: The cobalt-containing compounds are represented by the formulas. (Each of R, R, R, Rand Ris independently selected from the group consisting of H and linear, cyclic or branched hydrocarbon groups; provided that (a) R≠Rand/or Rwhen R, Rand Rare hydrocarbon groups, (b) Rand Rare hydrocarbon groups when Ris H, or (c) Ris a C2-C4 hydrocarbon group when Rand Rare H.SELECTED DRAWING: None

Inventors:
GATINEAU SATOKO
KO CHANGHEE
JEAN MARC GIRARD
JULIEN GATINEAU
Application Number:
JP2018064077A
Publication Date:
August 02, 2018
Filing Date:
March 29, 2018
Export Citation:
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Assignee:
AIR LIQUIDE
International Classes:
C07F19/00
Domestic Patent References:
JP2006257073A2006-09-28
Other References:
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SOMMER, LEO H.; LYONS, J. E.; FUJIMOTO, HIROSHI: "Stereochemistry of asymmetric silicon. XV. Stereospecific hydrosilation and exchange reactions of", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 91(25), JPN6018041231, 1969, pages 7051-7061
CERVEAU, GENEVIEVE; COLOMER, ERNESTO; CORRIU, ROBERT J. P.: "Cleavage of silicon- and germanium-transition metal bonds. Dependence of the stereochemistry on the", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 236(1), JPN6018041232, 1982, pages 33-52
Attorney, Agent or Firm:
Mitsue Obuchi
Yukio Fuse