To realize the scale-down and the reduction of manufacture cost of an interference type color filter array consisting of dielectric multilayer film.
The interference type filter layers 31, 32 and 33 for B, R and G are respectively pattern-formed corresponding to a pixel electrode 41b for B, a pixel electrode 41r for R and a pixel electrode 41g for G and laminated each other through light transmissive interlayer films 35, 36 and 37. Therefore, since several kinds of interference type filter layers are respectively arranged on the different layer through the interlayer film, the interlayer film being foundation functions as an etching stopper or an etching buffer in the case of patterning the filter layers, and dry etching can be performed to realize the scale-down of the color filter. Since a light shielding area is realized by superposing the filters, the number of processes is reduced and the manufacture cost is reduced.
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| WO/2001/004538 | DEVICE FOR SOFT IRRADIATION |
Masatake Shiga
Masakazu Aoyama
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