PURPOSE: To improve the developability, transparency, solvent resistance and adhesiveness to a substrate of a color filter resist soln. contg. a coloring material, a photopolymn. initiation system, an ethylenic compd., an org. high molecular dispersant and a solvent.

CONSTITUTION: This color filter resist soln. contains an org. high molecular dispersant made of a copolymer of a monomer having a phenyl group with a monomer having a carboxylic acid group by 5-50wt.% of the amt. of a coloring material. The amt. of the dispersant adsorbed on the coloring material is 2-15wt.% of the amt. of the coloring material. The coloring material is dispersed in ≤0.23μm average particle diameter. The dispersant disperses the coloring material in this resist soln. at a high concn. When this resist soln. is applied to a substrate, patternwise exposed and developed, the unexposed part of the resultant color filter resist contg. the coloring material at a high concn. is rapidly dissolved during development without deteriorating the adhesion of the exposed part to the substrate. Sufficiently high adhesiveness of the exposed part to the substrate is maintained, satisfactory developability is ensured and a high quality resist pattern can be formed.