Title:
COLOR FILTER WITH TRANSPARENT FLATTENING FILM AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH1172610
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To efficiently flatten the surface of a color filter even when a transparent flattening film is formed to have the film thickness as small as possible by forming the transparent flattening film which is at least once subjected to irradiation of active energy rays so as to adjust levels of the color filter surface or pixels. SOLUTION: A color filter substrate is prepared by forming pixels, and if necessary, a black matrix and the like on a transparent substrate. Then an active energy ray- curing type transparent flattening film is formed on the color filter substrate. The whole surface or a part of this transparent flattening film is irradiated with active energy rays such as UV rays for one or more times. When such a material of the transparent flattening film that gives larger film thickness in an exposed part after thermal hardening relative to the film thickness in a nonexposed part is used, irradiation of active energy rays is controlled in such a manner that the part with small ruggedness is more irradiated with rays in the color filter substrate. Therefore, after thermal hardening the film thickness in the exposed part increases relatively to the nonexposed part and step difference in surface levels of the whole substrate can be decreased.
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Inventors:
SAITO NORIYUKI
TOMONO HIDEKUNI
TOMONO HIDEKUNI
Application Number:
JP23393097A
Publication Date:
March 16, 1999
Filing Date:
August 29, 1997
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G02B5/20; G02F1/1333; (IPC1-7): G02B5/20; G02F1/1333
Attorney, Agent or Firm:
Kunihiko Wakabayashi
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