Title:
EQUIPMENT AND METHOD FOR CHEMICAL LIQUID PROCESSING
Document Type and Number:
Japanese Patent JP3144036
Kind Code:
B2
Abstract:
PURPOSE: To prevent contamination of an object to be processed by chemical liquid, by installing a lid which covers a chemical liquid processing chamber and is movable and capable of ventilation, processing the object with chemical liquid in the state that the object is covered with the lid, rinsing the object, and preventing the vapor of the chemical liquid from flowing outward with the lid.
CONSTITUTION: The air sucked by a fan 7 is supplied to a chemical liquid processing tank 1 via a filter 8. A lid 2 which is movable and capable of ventilation is arranged on the tank 1. The lid 2 consists of two lids having a plurality of small holes for ventilation, which lids can be opened to the right and the left. A cut-elimination part is formed in the upper part of the tank 1. When the tank is covered with the lid 2, the cut elimination part forms a gap, which serves as an exhaust vent 12. When the air supplying amount and the air discharging amount for exhausting the inside of the tank 1 from the exhaust vent 12 are increased, vaporization of the chemical liquid is accelerated, so that an exhaust duct 6 restrains the wind velocity at the lid 2 to be the lowest limit. Thereby the vaporization of the chemical liquid is prevented from diffusing outward through the lid 2.
Inventors:
Kazushige Komatsu
Kenji Watanabe
Kenji Watanabe
Application Number:
JP8583092A
Publication Date:
March 07, 2001
Filing Date:
April 08, 1992
Export Citation:
Assignee:
富士通株式会社
富士通ヴィエルエスアイ株式会社
富士通ヴィエルエスアイ株式会社
International Classes:
F24F7/06; H01L21/02; (IPC1-7): H01L21/02; F24F7/06
Domestic Patent References:
| JP4104841A | ||||
| JP312238A |
Attorney, Agent or Firm:
Teiichi Igeta