To provide a complex which is excellent in self-cleaning properties and NOx removability and does not deteriorate a base material even when the complex is formed directly on the base material without arranging a protective layer on the base material.
The complex has a film-like shape of such a structure that an inorganic oxide particle (A) forms a continuous phase having pores and a resin composition particle (B) and a metal oxide particle (C) having photocatalytic activity are dispersed in the continuous phase. The complex contains 35-75 mass% inorganic oxide particle (A), 10-60 mass% resin composition particle (B) and 4-20 mass% metal oxide particle (C), has 10-40 vol.% porosity X and satisfies the condition shown by expression (1): 3/RcD54/Rc (wherein D is the film thickness of the complex; Rc (unit: mass%) is the content of the metal oxide particle (C)).
HITOKUMA TATSURO
MASAKO TERUAKI
JP2008031297A | 2008-02-14 | |||
JPH11140433A | 1999-05-25 | |||
JP2008031297A | 2008-02-14 | |||
JPH11140433A | 1999-05-25 |
WO2000018504A1 | 2000-04-06 | |||
WO2000018504A1 | 2000-04-06 |
Toshifumi Onuki
Kazuhiko Naito