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Title:
COMPOSITE MOLDING FOR SEPARATING GAS
Document Type and Number:
Japanese Patent JPS5955309
Kind Code:
A
Abstract:

PURPOSE: To provide a composite molding for separating gas having high separating power for gas by providing a low temp. plasma polymer film of an org. compd. to the molding having a specific oxygen permeation characteristic.

CONSTITUTION: A titled composite molding is produced by providing a low temp. plasma polymer film having 0.01W1μm film thickness consisting of an org. silicon compd. on a molding having ≥1×10-3cm2.cm/cm2.sec.cmHg coefft. of oxygen permeation in a gas permeation section and has ≥2.5 coefft. of sepn. For example, a silicone rubber sheet having 50μm thickness obtd. by a calendering method is set in a plasma generator, and after the inside of the generator is evacuated down to 10-4Torr, the vapor of trimethyl vinyl silane as an org. monomer is introduced into the generator and is adjusted and maintained to and at 0.2Torr while the vapor is kept flowed. High frequency electric powder of 13.56MHz and 150W is applied to the same in this state to generate the low temp. plasma of trimethyl vinyl silane, thereby forming a plasma polymer film on the silicone rubber sheet. The coefft. of permeation oxygen of the film is 3.0×10-8 without the plasma treatment and 2.4×10-8 with the treatment and the sepn. rate for nitrogen is increased from 2.0 to 3.1.


Inventors:
NAKAMURA TAKATERU
NOMURA HIROKAZU
UENO SUSUMU
Application Number:
JP16618282A
Publication Date:
March 30, 1984
Filing Date:
September 24, 1982
Export Citation:
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Assignee:
SHINETSU CHEM IND CO
International Classes:
B01D53/22; B01D69/12; (IPC1-7): B01D13/00; B01D53/22
Domestic Patent References:
JPS5658518A1981-05-21
JPS5794304A1982-06-11
JPS5791708A1982-06-08
JPS5781805A1982-05-22
JPS58180205A1983-10-21
JPS588517A1983-01-18
JPS586208A1983-01-13
JPS586207A1983-01-13
Attorney, Agent or Firm:
Ryoichi Yamamoto