COMPOSITION FOR ACID TRANSFER, ACID TRANSFER FILM, AND PATTERN FORMING METHOD

Japanese Patent JP2010191409

A

To provide an acid transfer composition which can uniformly and very precisely diffuse acid all over the resin surface to make a pattern and can obtain an acid transfer film in highly stabilized dimensions all over this patterned resin surface, and also to provide an acid transfer film using it, and a pattern forming method which can make a pattern by the existing photolithography by using this film.

The composition contains (A) a radiation-sensitive acid generator, (B) a polymer having a group containing nitrogen, and (C) a ketone solvent. The polymer (B) is desirable to have specific (meta) acrylamide structure units. The acid transfer film is made by using this composition. The pattern forming method includes a second resin film forming step of forming the second resin film as the acid transfer film on a first resin film which contains a resin including acid dissociation groups but does not contain a radiation-sensitive acid generator.

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NISHIKAWA KOJI

JP2009278940A

September 02, 2010

December 08, 2009

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JSR CORP

G03F7/095; C08F22/10; C08F22/36; G03F7/004; G03F7/38; H01L21/027

JP2007316373A	2007-12-06
JPH1195418A	1999-04-09
JP2003233189A	2003-08-22
JP2006169499A	2006-06-29
JP2006072329A	2006-03-16

WO2007054813A2

2007-05-18

Kiyoshi Kojima
Yoshinobu Hagino
Naoya Taniguchi

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