To provide a composition for use in antistatic film formation which is capable of forming a transparent coated film or resin molded article that is excellent in the antistatic performance, haze, transparency, strengths, scuffing resistance and hardness.
The composition for use in antistatic film formation contains (i) an inorganic oxide particulate having on the surface a sulfonic acid group and (ii) a matrix forming component, with the above matrix forming component being the hydrolyzate of an organic silicon compound or the coating resin which has a proton conductivity, and furthermore contains (iii) a proton donor. The above inorganic oxide particulate has a content of the sulfonic acid group on the surface of 15-45% by weight relative to the inorganic oxide particulate having a sulfonic acid group on the surface.
COPYRIGHT: (C)2007,JPO&INPIT
Tsuguo Koyanagi
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| JP2004281271A | ||||
| JP10007932A |
Koji Makimura
Chihata Takahata
Toru Suzuki