COMPOSITION FOR FORMING LOW REFRACTIVE INDEX FILM AND PRODUCTION METHOD OF THE SAME, AND FORMATION METHOD OF LOW REFRACTIVE INDEX FILM

Title:

COMPOSITION FOR FORMING LOW REFRACTIVE INDEX FILM AND PRODUCTION METHOD OF THE SAME, AND FORMATION METHOD OF LOW REFRACTIVE INDEX FILM

Document Type and Number:

Japanese Patent JP2014201598

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a composition for forming a low refractive index film that forms a low refractive index film in which a low index of refraction is possessed, antireflection effect is high, and adhesion with a substrate, repellency and an antifouling property of a film surface are excellent; a production of the same; and a formation method of the low refractive index film.SOLUTION: A composition of a low refractive index film is prepared by that silicon alkoxide (A) is mixed with water (B), an inorganic acid or an organic acid (C), and organic solvent (D) by a prescribed ratio, a hydrolysate of the silicon alkoxide (A) is generated, and further the hydrolysate is mixed with a silica sol (E) in which a fumed silica particle is dispersed in a liquid medium by a prescribed ratio.

Inventors:

HYUGANO REIKO
YAMAZAKI KAZUHIKO

Application Number:

JP2013075743A

Publication Date:

October 27, 2014

Filing Date:

April 01, 2013

Export Citation:

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