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Title:
COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE WITH PASSIVATION LAYER AND METHOD OF MANUFACTURING THE SAME, SOLAR CELL ELEMENT AND METHOD OF MANUFACTURING THE SAME, AND SOLAR CELL
Document Type and Number:
Japanese Patent JP2016051848
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for forming a passivation layer which allows for formation of a passivation layer excellent in patternability and passivation effect, by a simple technique.SOLUTION: A composition for forming a passivation layer contains niobium alkoxide represented by Nb(OR)(in the formula, Rrepresents an alkyl group or an aryl group, independently), and water.SELECTED DRAWING: Figure 1

Inventors:
HAYASAKA TAKESHI
NOJIRI TAKESHI
KURATA YASUSHI
TANAKA TORU
MORISHITA MASATOSHI
KODAMA SHUNSUKE
Application Number:
JP2014177034A
Publication Date:
April 11, 2016
Filing Date:
September 01, 2014
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
H01L31/0216; C08G79/14; H01L31/068
Attorney, Agent or Firm:
特許業務法人太陽国際特許事務所