To provide the subject composition for removing residual materials of a polymer material, an organic material, an organic metal and a metal oxide from a substrate, containing a hydroxylamine compound, an aminoalcohol compound miscible with the hydroxylamine compound and a gall compound.

This composition contains (A) hydroxylamine, (B) at least one aminoalcohol compound miscible with the component A and (C) a gall compound, preferably represented by the formula (R is H, a 1-10C alkyl or an aryl; X is H, a halogen or a 1-5C alkyl). The component B is preferably a monoamine, diamine or triamine having a 1-5C alcohol group, e.g. an aminoalcohol of the formula R1R2-N-CH2-CH2-O-R3(R1 and R2 are each independently H, CH3, CH3CH2 or CH2CH2OH; R3 is CH2CH2OH). Furthermore, the composition contains preferably about 10-70wt.% component A, about 30-60wt.% component B and about 5-15wt.% component C and the balance of water, etc.