Title:
COMPOSITION FOR INSULATING MATERIAL AND ORGANIC THIN-FILM TRANSISTOR USING THE SAME
Document Type and Number:
Japanese Patent JP2017016820
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for an insulating material, capable of forming a gate insulating layer having a high dielectric constant and a low dielectric loss tangent.SOLUTION: The composition for an insulating material contains a polymer compound having a group represented by formula (1) in a repeating unit. [In the formula, Rand Reach independently represent a hydrogen atom, an optionally substituted alkyl group, an optionally substituted alkoxy group, a halogen atom, a nitro group, or a cyano group; and Rand Rmay be bonded to each other to form a ring together with carbon atoms to which they are bonded.]SELECTED DRAWING: None
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Inventors:
YAHAGI MITSURU
Application Number:
JP2015130753A
Publication Date:
January 19, 2017
Filing Date:
June 30, 2015
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
H01B3/30; C08F22/22; C08L33/14; H01L21/312; H01L21/336; H01L29/786
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto