Title:
COMPOSITION AND METHOD FOR PHOTOLITHOGRAPHY
Document Type and Number:
Japanese Patent JP2007102228
Kind Code:
A
Abstract:
To provide a new composition giving improved lithographic results, particularly, to provide a new composition and a method resulting in improved resolution of a developed relief image.
An overcoating layer composition is applied above a photoresist composition for immersion lithography processing as well as non-immersion imaging.
Inventors:
WANG DEYAN
XU CHENG-BAI
XU CHENG-BAI
Application Number:
JP2006271751A
Publication Date:
April 19, 2007
Filing Date:
October 03, 2006
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C08F232/08; G03F7/11; H01L21/027
Domestic Patent References:
| JP2006308814A | 2006-11-09 | |||
| JP2006163345A | 2006-06-22 |
Foreign References:
| WO2005088397A2 | 2005-09-22 | |||
| WO2008035640A1 | 2008-03-27 | |||
| WO2006091523A2 | 2006-08-31 |
Attorney, Agent or Firm:
Minoru Kondo
Koji Hashimoto
Koji Hashimoto
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