Title:
COMPOSITION FOR NANOIMPRINT
Document Type and Number:
Japanese Patent JP2012153141
Kind Code:
A
Abstract:
To provide a composition for nanoimprint which can maintain the shape of a relief pattern even when a mold is repeatedly pressed thereto and can prevent the relief pattern surface from being contaminated with a release agent such as surfactant.
The composition for nanoimprint includes a fluorine-containing compound (C) that is a fluorosilsesquioxane having 1-100C organic group. In a relief pattern forming method, a coat is formed by applying the composition to a substrate followed by heating, and the mold is pressed to the coat to form a relief pattern in which a negative image of the pattern engraved in the mold is formed on the coat.
Inventors:
SATO HIROYUKI
DEYAMA YOSHIHIRO
YAMAHIRO MIKIO
DEYAMA YOSHIHIRO
YAMAHIRO MIKIO
Application Number:
JP2012039841A
Publication Date:
August 16, 2012
Filing Date:
February 27, 2012
Export Citation:
Assignee:
JNC CORP
International Classes:
B29C59/02; C08K5/10; C08K5/20; C08L33/16; C08L43/04; C08L63/00; H01L21/027
Domestic Patent References:
JP2005092099A | 2005-04-07 |
Attorney, Agent or Firm:
Hiroshi Kobayashi
Nobushi Furuhashi
Yasuhito Suzuki
Nobushi Furuhashi
Yasuhito Suzuki
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