COMPOSITION FOR ORGANIC ANTI-REFLECTION FILM AND METHOD FOR PRODUCING THE SAME

Title:

COMPOSITION FOR ORGANIC ANTI-REFLECTION FILM AND METHOD FOR PRODUCING THE SAME

Document Type and Number:

Japanese Patent JP2001158810

Kind Code:

A

Abstract:

To provide a composition for an organic anti-reflection film which can prevent reflection in the lower film layer of a photoresist film in a process for forming hyperfine patterns in a semiconductor producing process, to provide a method for producing the composition and to provide a method for forming organic anti-reflection film patterns by using the composition.

This composition for an organic anti-reflection film can be produced by using a compound as a crosslinking agent having a structure of chemical formula 13 and a compound as an optical absorption agent having a structure of chemical formula 14 wherein b:c is (0.1 to 1.0):(0.1 to 1.0); R1 and R11 are each H or methyl group; R1, R2 and R4 are each a 1-5C alkyl substituted in its side chain or its principal chain; and R3 is H or a 1-5C alkyl substituted in its side chain or its principal chain.

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Inventors:

JUNG JAE CHANG
KONG KEUN-KYU
JUNG MIN HO
KO SEION
HAKU KIKO

Application Number:

JP2000271787A

Publication Date:

June 12, 2001

Filing Date:

September 07, 2000

Export Citation:

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Assignee:

HYUNDAI ELECTRONICS IND

International Classes:

G03F7/004; C07C31/20; C07C53/00; C08F2/06; C08F4/04; C08F4/34; C08F212/08; C08F220/28; C08K5/42; C08L25/14; C08L29/10; C08L33/14; C09D5/00; C09D125/14; C09D133/06; C09K3/00; G02B1/11; G02B1/111; G03F7/09; G03F7/11; G03F7/20; G03F7/38; H01L21/027; (IPC1-7): C08F212/08; C08F2/06; C08F4/04; C08F220/28; C08K5/42; C08L25/14; C08L29/10; C08L33/14; C09D5/00; C09D125/14; C09D133/06; C09K3/00; G02B1/11; G03F7/004; H01L21/027

Attorney, Agent or Firm:

Hironobu Onda (1 person outside)

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